Scanning Electron Microscopy Facility

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About instrument (Carl Zeiss EVO 50)

Scanning Electron Microscope is a versatile analytical microscope with a large specimen chamber and can handle large specimens at the analytical working distance of 8.5mm owing to a combination of the inclined detectors and the sharp conical objective lens.


ENERGY DISPERSIVE X-RAY MICROANALYSIS

Microstructures at SEM can be analyzed for its elemental composition in more detail using EDX system. This is a non-destructive analysis and the elements and their concentration in the sample can be determined reasonably accurately. EDS (EDX) Analysis provides elemental/Phase composition analysis of a sample inside a SEM. Also microstructural analysis i.e. EBSD (Electron BackScatter Diffraction Analysis) can be done to characterize grain structures. INCA and AZtec from Oxford is a new and revolutionary materials characterization system that gathers accurate data at the micro- and nanoscales

Essential Specification: EVO 50

  Resolution

2.0nm@ 30kV

  Acceleration Voltage

0.2 to 30 kV

  Magnification

5x to 1,000,000x

  Field of View

8.5 mm at the Analytical Working Distance (AWD)

  X-ray Analysis

8.5 mm AWD and 35° take-off angle

  Detectors

SE in HV - Everhart-Thornley

BSD in all modes - quadrant semiconductor diode

Some salient features of EDX analysis of known or unknown materials

  • Qualitative and quantitative analysis for all elements from carbon upwards in the periodic table
  • Quantitative analysis of homogenous bulk materials having features = 2 µm
  • Qualitative analysis of features = 0.2 µm
  • Detection limits typically 0.1 – 100 Wt% for most elements
  • Multi-element X-ray mapping and line scans Particle analysis – Detection, analysis, morphology and size.



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About instrument (Nova NanoSEM 450)

The Nova NanoSEM is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution. The NanoSEM Schottky field-emission source allows the user to achieve high imaging resolution at a range of 0.2-30 kV, at both low (high-resolution imaging) and high (micro analytical imaging) currents. Secondary electron (SE) imaging can be undertaken in both field-free and immersion mode for comprehensive low-to-high resolution imaging of a variety of samples. The Nova NanoSEM is configured with a Bruker SDD-EDS detector and can be manually fitted with a backscattered electron detector for the convenient visualization of compositional differences across the specimen surface

  Resolution

1.0nm@ 30kV

  Acceleration Voltage

0.2 to 30 kV

  Magnification

5x to 1,000,000x with HR/UHR Mode

  Field of View

5.0 mm at the Analytical Working Distance (AWD)

  X-ray Analysis

5.0 mm AWD and 35° take-off angle

  Detectors

In-lens SE detector (TLD-SE)

In-lens BSE detector (TLD-BSE)

Everhardt-Thornley SED

Low vacuum SED (LVD)

High sensitivity low kV Directional Backscattered Detector (DBS),

BSD in all modes - quadrant semiconductor diode



Contact Details

  Convener:             Prof. K. Kulkarni (kkaustub@iitk.ac.in)

Internal:6102

  Staff Incharge:      Samata Samal (samata@iitk.ac.in)
                                  Anurag Prashad

Internal:7140
Internal:7140

  Operator:               Sandeep

Internal: