Pulsed LASER Deposition Unit |
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Pulsed LASER Deposition is thin film deposition technique in which highly energetic pulsed LASER beam is focused on the target material in presence of vacuum or controlled background gas environment. This causes the vaporization of target material in form of plasma plume which is deposited as thin film on the substrate. Stoichiometry and roughness of the film can be controlled by manipulating LASER parameters, gas pressure inside the chamber and substrate temperature, The unit is comprised of two parts: LASER and deposition chamber. LASER specifications:
Chamber specifications:
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Location: |
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Department Of Materials Science & Engineering, |
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Contact: |
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Prof.Ashish Garg This email address is being protected from spambots. You need JavaScript enabled to view it. Prof. Deepak Gupta This email address is being protected from spambots. You need JavaScript enabled to view it. |
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