Systems and methods for dry processing fabrication of binary masks with arbitrary shapes for ultra-violet laser micromachining

Patent Status: 

Patent Filed

Indian Patent Applicaton No: 

1858/DEL/2012

Date Filed: 

18.06.2012

Patent Category: 

Overview: 

Versatile multielement focused ion beam system that utilizes intense collimated microwave plasma.

Key Features: 

  • The mask possesses (upto few cm2 of coverage area) good thermal stability, high damage threshold for the machining laser and robust handling properties.
  • The mask can be made with the same laser used from the micromachining along with minimal coating facilities.

Applications: 

  •  Surface texturing for Biomedical applications, heat transfer.
  •  Developing defractive optical elements..
  •  Metamaterial structures for Infrared materials.
  • Masks required for semiconductor and organic photovoltaic Industries.

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