System and Method for Characterizing Focused Charged Beams

Patent Status: 

Patent Filed

Indian Patent Applicaton No: 

1301/DEL/2012

Department: 

Patent Category: 

Overview: 

Method for rapid measurement of charged particle beam profiles and currents particularly at submicron length scales.

Key Features: 

  • Measurement of submicron focused charged particle beams including both ions and electrons.
  • Both the spatial profile and current of the beam can be measured using this technique.
  • Provides a solution for accurate and relatively fast measurements of spatial profiles of submicron beams that has been extremely difficult until now.

Applications: 

  • For measuring charged particle beams of a wide range of diameters and beam sizes in the submicron to nanometer range for electrons and ions, positive as well as negative.

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