A Method of Fabricating a Dielectric Material with Enhanced Sensitivity

Patent Status: 

Patent Filed

Indian Patent Applicaton No: 

1852/DEL/2010

Patent Category: 

Overview: 

Enhancing the sensitivity in electrolyte-insulator-semiconductor (EIS) based sensors.

Key Features: 

  • A cost effective fabrication method for a dielectric material that enhances the sensitivity of an electrolyte-insulator-semiconductor (EIS) device.
  • The novelty lies in the tunable texturizing of the dielectric surface with nano-/meso particles. This enables improvement of the sensitivity.
  • The process fits into the semiconductor manufacturability processing scheme.
  • The design enables miniaturization.

Applications: 

  • The device is a miniaturized pH meter capable of handling small volumes (~ microliters) which are not possible in conventional pH meters.
  • For analytical testing/ detection: Pharmaceutical/biomedical, Chemical Process, Food/Beverage and Environmental Testing etc.

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