An Apparatus for Shadow-Mask Deposition and Method Thereof

Patent Status: 

Patent Filed

Indian Patent Applicaton No: 



A shadow mask deposition apparatus

Schematic of vacuum deposition chamber with a load lock attached to it

Key Features: 

  • Method for thin film vacuum deposition on one or more substrates
  • Capability of changing unlimited number of in situ shadow mask.
  • To provide zero spacing between mask and substrate so as to achieve more accurate transfer of mask pattern on the film being deposited.
  • To provide a loading means to load the substrate and mask of at least one pattern to the vacuum systems.
  • No need for multiple evaporation chambers or cluster tools.
  • No constraint on the type of deposition chamber being used


  • Vacuum deposition system

Contact us

Search form

Connect with us

Follow us