EQUIPMENT LIST

 

Sputter Coater

 

 

Short Description: Method for preparation of thin films of complex multi-component compositions stoichiometry close to targets used and for modification of their properties. Allows the deposition in atmospheres other than vacuum.

 

kid

NSOM/Raman/Confocal/AFM

 

 

Short Description: Used for UV Lithography (200nm) and Near Field imaging of features as small as 100nm. Raman Spectra and Imaging

 

kid

Feild Emission Scanning Electron Microscope with E-beam Lithography:

 

 

Short Description: Used for lithography less than 25nm feature size

 

kid

Maskless Photo-Lithography

 

 

Short Description: A unique technique for fabrication of micro size structures for microfluidics, optoelectronics, electronic and photonic applications on different substrates using various kinds of photoresists. The system is very useful for the research purposes in any group research by providing simple, easy, cost effective and fast processing. Major advantages of this technique are that it does not require any physical mask

 

kid

Nano Imprint Lithography (NIL):

 

 

Short Description: Imprint lithography instruments have the ability to fabricate structures from the micro- to the nanoscale (up to 10nm resolution) with high precision in a wide variety of materials. As in lithography, Nanoimprinting can create resist patterns and additionally it can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

 

kid

Wide Angle X-Ray Diffractometer

 

Short Description: For elemental and structural analysis of materials.

 

kid

Ellipsometer:

 

 

Short Description: Measures optical constant, thickness and refractive index of thin film

 

kid

Optical Thickness Profiler:

 

Short Description: Measure surface roughness in nm range and also for 3D optical imaging of surface.

 

kid

 

 

Back To top