Old Website(July 2005-July 2012)

 


LIST OF EQUIPMENT-  
A. Equipment for Materials Preparation & Characterization

1. Pulse Laser for Thin Film Deposition System (PLD System) -

 

Method for preparation of thin films of complex multi-component compositions stoichiometry close to targets used and for modification of their properties. Allows the deposition in atmospheres other than vacuum.

 

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2. NSOM/Raman/Confocal/AFM

 

Used for UV Lithography (200nm) and Near Field imaging of features as small as 100nm. Raman Spectra and Imaging

 

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3. Scanning Electron Microscope with E-beam Lithography:

 

Used for lithography less than 25nm feature size

 

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4. Maskless Photo-Lithography

A unique technique for fabrication of micro size structures for microfluidics, optoelectronics, electronic and photonic applications on different substrates using various kinds of photoresists. The system is very useful for the research purposes in any group research by providing simple, easy, cost effective and fast processing. Major advantages of this technique are that it does not require any physical mask,

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4. Imprint Lithography:

Imprint lithography instruments have the ability to fabricate structures from the micro- to the nanoscale (up to 10nm resolution) with high precision in a wide variety of materials. As in lithography, Nanoimprinting can create resist patterns and additionally it can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

 

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6. Adiabatic Demagnetization Fridge for MilliKelvin Temperatures:

 

This instrument works on the principle of The Magnetocaloric effect which is a magneto-thermodynamic phenomenon causing a reversible change in temperature of a suitable material when the material is exposed to a changing magnetic field.

 

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7. Small Angle XRD:

 

Characterization tool used for estimating particles of micron & sub micron sizes and their distribution. Particle shape can also be found.

 

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8. Wide Angle XRD:

 

For elemental and structural analysis of materials.

 

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3. 9. Ellipsometer:

 

To measure optical constant, thickness and refractive index of thin film

 

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10. Thickness Profiler:(mechanical stylus based)

To measure surface undulations, step height or cavity in micron and sub micron range

 

 

 

11. Optical Thickness Profiler:

 

Measure surface roughness in nm range and also for 3D optical imaging of surface.

 

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12. Multi-Potentiostat/Galvanostat:

This equipment is used for testing the Li-ion intercalation patterned carbon structures. Charging-discharging cycles of batteries are studied using a potentiostat having complex impedance measurement capability and cyclic voltametry. These characteristics are of particular importance for the microbattery applications. In addition to this, this instrument will also be use for depositing metallic contact pads and lines in the MEMS and NEMS. The potentiostat will also be useful for fundamental research in electrochemistry such as electron transfer kinetic study or electrochemical analysis of compounds at trace level. A fast potential scan can be used to highlight intermediate species of the reaction

 

 

 

13. Liquid CO2 supercritical:

The porosity and surface area of the carbon structures is a critical parameter in studies related to CMEMS and micro-batteries. Liquid CO2 SCD is the most conventional method of drying RF gels as it produces carbon structures with surface area as high as 1000 m2/g. Water is pore solvent for the RF gels prepared by sol-gel processing of resorcinol and formaldehyde precursors. Because of the high surface tension of water (72 dyne/cm), drying of as prepared RF-gels in air causes sever cracking of the gel. Therefore, the pore water is exchanged by ethanol and then liq CO2. Then the gel is dried by SCD that allows draining out the pore liquid of the gels while retaining the gel pore structure intact. Thus dried gels (aerogels) are highly porous with bulk densities <0.1 gm/cc

 

 

 

14. RF & DC Magnetron Sputtering Unit :

Thin film deposition equipment. Major advantage is that stoichiometry is preserved.

 

 

 

15. Thermal Evaporator:

 

Thin film deposition unit. Mainly used for metals, semiconductors and glass deposition.

 

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16. Langmuir-Blodgett troughs:

Technique to prepare mono layer films

 

 

 

17. Ultrasonic Bonder:

To make micro joints

 

 

18. Optical Microscope:

 

 

19. UV Visible IR Spectrophotometer:

Measures directly transmission and reflection of thin films. Absorption coefficient, refractive index and thickness of a film can be measured accurately.

 

 

 

20. Polymer printer:

The Nano eNablerâ„¢ system is a multifunctional surface patterning platform for dispensing attoliter to femtoliter volumes of biomolecules, nanoparticles and other liquids onto a wide variety of surfaces

 

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B. Supporting Equipment for Preparation

 

 

Glove Box

Plasma cleaners Balance (6 decimal)

Spin Coater

Vacuum ovens for clean rooms X-Y-Z motorized stage (~ 100 nm steps)

Millipore Water System:

Graphitizing Furnaces X-Y-Z Nanopositioning Stage (~ 10 nm steps)

UV Ozone treatment:

High Temperature Furnaces Cooling/heating bath

Vibration Isolation tables

Oil less compressors Oil less vacuum pumps

Ultrasonic cleaner and probe with variable intensity

Load cells with data acquisition Reverse Osmosis water for bulk applications

Wet Chemical Etcher

Lab-on-a-chip kit Plasma and UV Chambers

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