Mask less Photolithography

Mask less Photolithography
The SF-100 is an elegantly simple, easy to use micro patterning system. Through its unique patented design, the system allows user to fabricate micro-devices quickly and easily. It is capable of fabricating 15 μm features over 1.7 cm2 area, and 5 μm features over 0.2 cm2 area. Very complex structures can easily be fabricated just by drawing a bitmap image on the computer screen. Grayscale photolithography allows the fabrication of complex Micro-fluidic devices in a single step.
Location:
Thematic Unit of Excellence, IIT Kanpur
Contact:
Prof. Ashutosh Sharma This email address is being protected from spambots. You need JavaScript enabled to view it. Dr. Prabhat Dwivedi This email address is being protected from spambots. You need JavaScript enabled to view it. Dr. Dinesh Deva This email address is being protected from spambots. You need JavaScript enabled to view it.