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Thin-filmThickness Measurement System |
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Thickness and optical constants (n and k) are measured quickly and easily with the F20 advanced spectrometry system. Spectral analysis of reflectance from the top and bottom of the thin film provides thickness, refractive index, and extinction coefficient in less than a second. Virtually any smooth, translucent, or lightly absorbing film may be measured, including SiO2, SiNX, DLC, Photoresists, Polymer layers, Polyimide, Polysilicon, Amorphous Silicon, Silicon, Parylene and Industrial Coatings. For thickness measurements, all that is required in most cases is a smooth, reflective substrate. For optical constant measurements, a flat specularly reflecting substrate is required. If the substrate is transparent, the backside of the substrate must be prepared so that it is not reflective. Examples include: Silicon, Glass, Aluminum, GaAs, Steel, Polycarbonate, Polymer films etc. For measurements on patterned surfaces and other applications that require a spot size as small as 10 microns, just add the model F40 to the microscope. For common microscopes the F40 is a simple bolt-on attachment, complete with a c-mount for a CCD camera. |
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Location: |
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Thematic Unit of Excellence, |
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Contact: |
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Prof. Ashutosh Sharma This email address is being protected from spambots. You need JavaScript enabled to view it. Dr. Prabhat Dwivedi This email address is being protected from spambots. You need JavaScript enabled to view it. Dr. Dinesh Deva This email address is being protected from spambots. You need JavaScript enabled to view it. |
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